Workshop  /  January 27, 2025  -  January 31, 2025

Innovation Week

Inorganic Barrier Layers

The Fraunhofer FEP opens up new horizons for you in our new concept “Innovation Week”:
For companies and research institutions dedicated to the development of future-oriented technologies, we offer the exclusive opportunity to test innovative ideas directly in an industrial research environment and thus advance them significantly.

As part of our innovation week on the topic of “Inorganic barrier layers”, we are making our industry-oriented pilot plant novoFlex® 600 including HAD* technology available. We offer you and your team the ideal opportunity to test ultra-thin, transparent barrier layers made of aluminum oxide and silicon oxide for your specific applications and products. Using reactive, plasma-assisted electron beam evaporation, we prepare test material for your own customer-specific processing tests and material analyses. This enables you to get started with HAD technology in a cost-effective way, even with small quantities of material.  

For optimal preparation, we offer all Innovation Week participants an exclusive introduction to HAD technology. In an online presentation before the event begins, you will gain comprehensive insights into our technology and its many possible applications – so you and your team will be ideally prepared.

Our offers for you:

  • Get to know HAD technology in practice: Experience the technology processes in a realistic industrial environment.
  • Individual support: We will answer your questions directly on site.
  • Analyses: We are pleased to offer the additional options and expertise of the FEP analytical department.**
  • Flexible conditions of participation: The program is conducted in the presence of several customers. We make every effort to protect your confidential information in the best possible way.

For participation, please contact our Event Team at:
events@fep.fraunhofer.de

 

Expand your product portfolio with high-tech coating solutions and shape the future of innovative film applications together with us!

We look forward to your participation in our Innovation Week!

 

*HAD: Hollow Cathode Activated Deposition - plasma-activated vapor deposition using hollow cathode plasma sources

** This is an additional service that is subject to a fee.