Graphene layers promise great progress and increased efficiency in solar applications, energy storage and smart glass applications due to their outstanding properties, including transparency, barrier effect and conductivity. The lack of scalable deposition processes with consistently high layer quality at cost-efficient throughputs has so far prevented the breakthrough of this promising material. As part of the funded EU project NewSkin (GA No. 862100), the Fraunhofer Institute for Electron Beam and Plasma Technology FEP has developed an innovative PECVD process that enables the deposition of graphene at high process speeds and offers higher production throughputs and a wider range of substrates at lower process temperatures. The researchers will present the process at Manufacturing World Tokyo from June 19 - 21, 2024 at booth No. E 53-11 in Tokyo, Japan.
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