Fraunhofer Institute for Electron Beam
We develop these plasma-activated coating processes using high-performance plasma sources for industrial-scale manufacturing and large-area coating based on both PVD processes (plasma-activated high-rate evaporation and pulse-magnetron sputtering) and PECVD processes (plasma-activated chemical-vapor deposition).
The combination of extremely dense plasmas with extremely high coating rates results in the economical deposition of high-quality coatings. We develop integrated cleaning processes and plasma pre-treatment required for this purpose.
Plasma-activated large-area and precision coating
- Development of plasma-activated coating processes for industrial-scale manufacturing
- Development of large-area coatings based on both PVD and PECVD processes
- Development and application of integrated suitable cleaning processes and plasma pre-treatment